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688509

Sigma-Aldrich

Silicon tetrachloride

packaged for use in deposition systems

Synonym(s):

STC, Tetrachlorosilane

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About This Item

Linear Formula:
SiCl4
CAS Number:
Molecular Weight:
169.90
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

vapor density

5.86 (vs air)

Quality Level

vapor pressure

420 mmHg ( 37.7 °C)

Assay

99.998% trace metals basis

form

liquid

reaction suitability

core: silicon

bp

57.6 °C (lit.)

mp

−70 °C (lit.)

density

1.483 g/mL at 25 °C (lit.)

SMILES string

Cl[Si](Cl)(Cl)Cl

InChI

1S/Cl4Si/c1-5(2,3)4

InChI key

FDNAPBUWERUEDA-UHFFFAOYSA-N

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General description

Atomic number of base material: 14 Silicon

Pictograms

Skull and crossbonesCorrosion

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1A - STOT SE 3

Target Organs

Respiratory system

Supplementary Hazards

WGK

WGK 1

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Information

新产品

Certificates of Analysis (COA)

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  1. Which document(s) contains shelf-life or expiration date information for a given product?

    If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.

  2. How do I get lot-specific information or a Certificate of Analysis?

    The lot specific COA document can be found by entering the lot number above under the "Documents" section.

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    Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product. 

  5. Can the empty deposition cylinders be refilled?

    Yes, we are able to refill these cylinders through our SAFC Hitech group.  Please contact our Technical Service department by email at techserv@sial.com, and they will forward you to the appropriate SAFC Hitech representative for a quote.

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Sang Ho Lee et al.
Journal of the American Chemical Society, 127(25), 9071-9078 (2005-06-23)
A series of four asymmetrically aryl-substituted 9,9'-spiro-9-silabifluorene (SSF) derivatives, 2,2'-di-tert-butyl-7,7'-diphenyl-9,9'-spiro-9-silabifluorene (PhSSF), 2,2'-di-tert-butyl-7,7'-dipyridin-2-yl-9,9'-spiro-9-silabifluorene (PySSF), 2,2'-di-tert-butyl-7,7'-dibiphenyl-4-yl-9,9'-spiro-9-silabifluorene (BPhSSF), and 2,2'-di-tert-butyl-7,7'-bis(2',2' '-bipyridin-6-yl)-9,9'-spiro-9-silabifluorene (BPySSF) are prepared through the cyclization of the corresponding 2,2'-dilithiobiphenyls with silicon tetrachloride. These novel spiro-linked silacyclopentadienes (siloles) form transparent and stable
T Kapias et al.
Journal of hazardous materials, 81(3), 209-222 (2001-02-13)
Silicon tetrachloride is a toxic, corrosive water reactive substance that is used widely in the process industries. On spillage from containment it creates liquid pools that can either boil or evaporate. The main feature of the pool behaviour is the
Claudio Curti et al.
Organic letters, 13(17), 4738-4741 (2011-08-13)
Virtually perfect transmittal of the enolate reactivity up to five conjugated double bonds from the origin allows a series of furan-based silyloxypolyenes to add to aldehyde carbonyls at the most distant point of the molecule. Denmark's axially chiral bisphosphoramide/SiCl(4) combination
J R Piascik et al.
Dental materials : official publication of the Academy of Dental Materials, 25(9), 1116-1121 (2009-04-21)
The overall goal of this research was to develop a practical method to chemically modify the surface of high strength dental ceramics (i.e. zirconia) to facilitate viable, robust adhesive bonding using commercially available silanes and resin cements. Investigation focused on
Sherif Zein El Abedin et al.
Accounts of chemical research, 40(11), 1106-1113 (2007-05-25)
Due to their wide thermal windows, ionic liquids can be regarded as the missing link between aqueous/organic solutions and high-temperature molten salts. They can be employed efficiently for the coating of other metals with thin layers of tantalum, aluminum, and

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