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Synonym(s):
Al2O3 Etch, Aluminum Oxide Etchant, GaN Etch, Gallium Nitride Etchant, Si3N4 Etch, Silicon Nitride Etchant
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Application
Useful for fast and controllable etching of silicon nitride (Si3N4), galium nitride (GaN), or aluminum oxide (Al2O3).
Features and Benefits
Etch Rates @ 180 °C:
Aluminum oxide 120 Å/min
Silicon nitride 125 Å/min
Gallium nitride 80 Å/min
Silicon dioxide 1 Å/min
Silicon 1 Å/min
Aluminum oxide 120 Å/min
Silicon nitride 125 Å/min
Gallium nitride 80 Å/min
Silicon dioxide 1 Å/min
Silicon 1 Å/min
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1B
WGK
WGK 1
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Regulatory Information
危险化学品
Certificates of Analysis (COA)
Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.
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