663301
Trimethylaluminum
packaged for use in deposition systems
Recommended Products
vapor pressure
69.3 mmHg ( 60 °C)
Quality Level
description
heat of vaporization: ~41.9 kJ/mol (Dimer)
form
liquid
reaction suitability
core: aluminum
bp
125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg
mp
15 °C (lit.)
density
0.752 g/mL at 25 °C (lit.)
SMILES string
C[Al](C)C
InChI
1S/3CH3.Al/h3*1H3;
InChI key
JLTRXTDYQLMHGR-UHFFFAOYSA-N
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Related Categories
General description
Application
- A chemical vapor deposition precursor to fabricate PbSe quantum dot solids for optoelectronic devices.
- An aluminum precursor for the flame synthesis of alumina nanofibers.
- A reagent for efficient synthesis of allenes.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
Supplementary Hazards
WGK
nwg
Flash Point(F)
No data available
Flash Point(C)
No data available
Personal Protective Equipment
Regulatory Information
Certificates of Analysis (COA)
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