651826
Chromium etchant
standard
Synonym(s):
Cr etching solution
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About This Item
grade
standard
Quality Level
composition
volatiles, 85%
color
orange
bp
100 °C/1 atm
density
1.16 g/mL at 25 °C
Related Categories
General description
- Appearance - Clear orange
- pH - Acidic
- Etch Rate at 40 °C - 40 Å/second
- Etch Capacity (rate declines at ~70%) - 65 g/gallon
- Shelf Life - 1 year
- Storage Conditions - Ambient
- Filtration - 0.2 µm
- Recommended Operating Temperatures - 20-80 °C (30-40 °C most common)
- Rinse - Deionized water
- Photoresist Recommendations - KLT6000 Series, KLT 5300 Series, HARE SQT (SU-8 type), TRANSIST, or PKP -308PI
- Select Compatible Materials - Au, Ti, oxide, nitride, Si
- Select Incompatible Materials - Al, Ni, Cu, NiCr
- Compatible Plastics - HDPE, PP, PTFE, PFA, PVC
- Isotropy - Isotropic
- Incompatible Chemicals - Strong bases
Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.
Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.
Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our chromium etchant is filtered to remove all particulates above 0.2 microns. Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well-ventilated hood.
Application
The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si3N4, SiO2, Ti, and W surfaces
For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.
Features and Benefits
Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Aquatic Chronic 2 - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 2 - Skin Corr. 1B - Skin Sens. 1
Supplementary Hazards
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Certificates of Analysis (COA)
Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.
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Thermoelectric microconverter for energy harvesting systems.
Carmo J, et al.
IEEE Transactions on Industrial Electronics, 57(3), 861-867 (2010)
Pressure-driven Fermi surface reconstruction of chromium
Stillwell RL, et al.
Physical Review, 88(12) (2013)
Fabrication and Mechanical Properties Measurements of 3D Microtissues for the Study of Cell-Matrix Interactions.
The Surfaceome, 120(5), 303-328 (2018)
The regeneration and recycle of chromium etching solutions using concentrator cell membrane technology.
Chaudhary AJ, et al.
Chemosphere, 62(5), 841-846 (2006)
Irene Dolado et al.
Advanced materials (Deerfield Beach, Fla.), 32(9), e1906530-e1906530 (2020-01-25)
Van der Waals (vdW) materials host a variety of polaritons, which make them an emerging material platform for manipulating light at the nanoscale. Due to the layered structure of vdW materials, the polaritons can exhibit a hyperbolic dispersion and propagate
Protocols
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.
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