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Merck
CN

651796

Negative photoresist I

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About This Item

CAS Number:
9003-31-0
UNSPSC Code:
41116107
NACRES:
NA.23
MDL number:
MFCD00084438

Key Documents

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SMILES string

O1C(OCC(C1)(C)C)CCCCCCCC

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

InChI key

UBZVSDZJBLSIJG-UHFFFAOYSA-N

mol wt

average Mw 60,000-70,000 (polyisoprene)

composition

solids, 27-29 wt. %

dielectric constant

2.4

surface tension

29.2 dyn/cm

viscosity

465-535 cP(25 °C)

bp

122-142 °C (lit.)

density

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

storage temp.

2-8°C

Quality Level

100

Related Categories

General description

A stabilized, purified photoresist which exhibits superior resolution, adhesion, etch resistance and low pinhole density.
Available as part of Negative Photoresist kit 654892

signalword

Danger

Hazard Classifications

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

target_organs

Respiratory system

Storage Class

3 - Flammable liquids

wgk

WGK 3

flash_point_f

75.2 °F - closed cup

flash_point_c

24 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

Regulatory Information

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Certificates of Analysis (COA)

Lot/Batch Number
MKCK5970
MKCJ2028
MKCG8986
MKCJ0922
MKCF2182

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  1. Which document(s) contains shelf-life or expiration date information for a given product?

    If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.

  2. How do I get lot-specific information or a Certificate of Analysis?

    The lot specific COA document can be found by entering the lot number above under the "Documents" section.

  3. At what wavelength does Product 651796, Negative photoresist, have absorbance?

    This product has a spectral absorbance range of 310-480nm. The peak spectral sensitivity is around 355nm.

  4. How should Product 651796, Negative photoresist, be stored?

    It should be refrigerated to inhibit polymerization and warmed to room temperature before opening.  It should also be stored away from light sources and kept in the sealed bottle.

  5. How do I use Product 651796, Negative photoresist?

    Please refer to technical bulletin AL-217 for detailed procedures.

  6. When using Product 651796, Negative photoresist, how do I remove the photoresist film?  

    Hot chlorinated hydrocarbons such as those in Product No. 651761, Negative Resist Remover I, swell the photoresist, which effectively removes the resist film.  The ideal temperature at which to use the remover is 50-60°C.

  7. How do I find price and availability?

    There are several ways to find pricing and availability for our products. Once you log onto our website, you will find the price and availability displayed on the product detail page. You can contact any of our Customer Sales and Service offices to receive a quote.  USA customers:  1-800-325-3010 or view local office numbers.

  8. What is the Department of Transportation shipping information for this product?

    Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product. 

  9. My question is not addressed here, how can I contact Technical Service for assistance?

    Ask a Scientist here.

Boon-Siang Yeo et al.
Small (Weinheim an der Bergstrasse, Germany), 5(8), 952-960 (2009-03-06)
Fundamental advances have been made in the spatially resolved chemical analysis of polymer thin films. Tip-enhanced Raman spectroscopy (TERS) is used to investigate the surface composition of a mixed polyisoprene (PI) and polystyrene (PS) thin film. High-quality TER spectra are
S Wołoszczuk et al.
The European physical journal. E, Soft matter, 33(4), 343-350 (2010-12-02)
We simulate ABA triblock copolymer melts using a lattice Monte Carlo method, known as cooperative motion algorithm, probing various degrees of compositional asymmetry. Selected order-disorder transition lines are determined in terms of the segment incompatibility, quantified by product χN
Stéphane Dubascoux et al.
Journal of chromatography. A, 1224, 27-34 (2012-01-17)
This paper presents results from the first analyses of the mesostructure of natural rubber (NR) by asymmetrical flow field flow fractionation (AF4). The results are compared with those obtained by size exclusion chromatography (SEC) in terms of average molar masses
S M Al-Salem et al.
Journal of hazardous materials, 172(2-3), 1690-1694 (2009-08-29)
Thermo-chemical treatments (mainly pyrolysis) directed towards energy and products recovery provide a very promising alternative to open space disposal or landfilling, reducing in the process hazardous waste and potential contamination to soil and water resources. In this communication, we present
N Hambsch et al.
Journal of applied microbiology, 109(3), 1067-1075 (2010-04-23)
Natural rubber (poly-[cis-1,4-isoprene]) can be cleaved into 12-oxo-4,8-dimethyltrideca-4,8-diene-1-al by rubber oxygenase A (RoxA) isolated from Xanthomonas sp. RoxA is a novel type of dihaem dioxygenase with unknown cleavage mechanism of the rubber carbon backbone. Analysis of mutant RoxA after mutagenesis
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Protocols

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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