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Merck
CN

651761

Sigma-Aldrich

Negative resist remover I

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1 G
CN¥726.38

CN¥726.38

List priceCN¥1,130.66Save 36%

Available to ship onApril 11, 2025Details


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1 G
CN¥726.38

About This Item

UNSPSC Code:
12352300
NACRES:
NA.23

CN¥726.38

List priceCN¥1,130.66Save 36%

Available to ship onApril 11, 2025Details


Request a Bulk Order

shelf life

1 yr (cool area away from direct sunlight)

pH

<2 (20 °C)

bp

204-304 °C (lit.)

density

1.00 g/mL at 25 °C (lit.)

storage temp.

2-8°C

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This Item
59106873861N0756
Quality Level

100

Quality Level

200

Quality Level

100

Quality Level

100

bp

177 °C (lit.)

bp

153 °C/774 mmHg (lit.)

bp

177 °C (lit.)

bp

177 °C (lit.)

density

0.95 g/mL (lit.)

density

1.086 g/mL at 25 °C

density

0.95 g/mL (lit.)

density

0.95 g/mL (lit.)

General description

Available as part of Negative Photoresist kit 654892
Low pH formulation for removal of photoresist cured onto various substrates. Non-corrosive to metals and oxides. Does not contain chlorinated hydrocarbons, chromates, phenol, or phosphates. Performs well at room and elevated temperatures.

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Skin Corr. 1

Storage Class Code

8A - Combustible corrosive hazardous materials

WGK

WGK 3

Flash Point(F)

204.8 °F

Flash Point(C)

96 °C


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Protocols

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

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