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651761

Sigma-Aldrich

Negative resist remover I

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UNSPSC Code:
12352300
NACRES:
NA.23

shelf life

1 yr (cool area away from direct sunlight)

Quality Level

100

pH

<2 (20 °C)

bp

204-304 °C (lit.)

density

1.00 g/mL at 25 °C (lit.)

storage temp.

2-8°C

Related Categories

General description

Available as part of Negative Photoresist kit 654892
Low pH formulation for removal of photoresist cured onto various substrates. Non-corrosive to metals and oxides. Does not contain chlorinated hydrocarbons, chromates, phenol, or phosphates. Performs well at room and elevated temperatures.

Signal Word

Danger

Hazard Statements

H302,H304,H314,H351,H411

Hazard Classifications

Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Skin Corr. 1

WGK

WGK 3

Flash Point(F)

204.8 °F

Flash Point(C)

96 °C

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Protocols

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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