Skip to Content
Merck
CN

496863

Pentakis(dimethylamino)tantalum(V)

99.99%

Synonym(s):

PDMAT, TADMA, Ta(NMe2)5, Tantalum dimethylamide

Sign In to View Organizational & Contract Pricing.

Select a Size

About This Item

Linear Formula:
Ta(N(CH3)2)5
CAS Number:
19824-59-0
Molecular Weight:
401.33
NACRES:
NA.23
PubChem Substance ID:
24873088
UNSPSC Code:
12352103
MDL number:
MFCD01631286

Key Documents

View All Documentation
Technical Service
Need help? Our team of experienced scientists is here for you.
Let Us Assist
Technical Service
Need help? Our team of experienced scientists is here for you.
Let Us Assist

Product Name

Pentakis(dimethylamino)tantalum(V), 99.99%

InChI

1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5

SMILES string

CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C

InChI key

VSLPMIMVDUOYFW-UHFFFAOYSA-N

assay

99.99%

form

solid

reaction suitability

core: tantalum
reagent type: catalyst

mp

100 °C (dec.) (lit.)

Quality Level

100

Related Categories

Features and Benefits

Volatile solid CVD precursor to tantalum nitride (TaN) thin films. Also yields tantalum oxide (Ta2O5) thin films when O2, H2O, NO or H2O2 is present during the deposition process. Ta2O5 thins films show promise as gate dielectric materials in the manufacture of integrated circuits.

General description

Atomic number of base material: 73 Tantalum

pictograms

FlameCorrosion
GHS02,GHS05

signalword

Danger

Hazard Classifications

Eye Dam. 1 - Flam. Sol. 1 - Skin Corr. 1B - Water-react 1

Storage Class

4.3 - Hazardous materials which set free flammable gases upon contact with water

wgk

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
SHBP9453
SHBG7719V
SHBC8197V
SHBB0436V
29796BP

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

James E Maslar et al.
Applied spectroscopy, 74(10), 1219-1229 (2019-10-17)
A nondispersive infrared gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition processes. The nondispersive infrared analyzer was designed to simultaneously measure the partial pressure of pentakis(dimethylamido) tantalum, a metal precursor employed in high volume

Articles

High Purity Metalorganic Precursors for CPV Device Fabrication

High Purity Metalorganic Precursors for CPV Device Fabrication

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service