463094
Trimethylboron
electronic grade, ≥98.35%
Synonym(s):
Trimethylborane
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About This Item
Recommended Products
grade
electronic grade
Assay
≥98.35%
form
gas
reaction suitability
core: boron
impurities
<1 ppm Oxygen (O2)
<1.5% Dimethylethylborane [B(CH3)2C2H5]
<10 ppm Carbon dioxide (CO2)
<10 ppm Nitrogen (N2)
<100 ppm Methane (CH4)
<1000 ppm Trimethylamine (TMA)
<50 ppm Hydrogen (H2)
bp
−20.2 °C (lit.)
mp
−161.5 °C (lit.)
SMILES string
CB(C)C
InChI
1S/C3H9B/c1-4(2)3/h1-3H3
InChI key
WXRGABKACDFXMG-UHFFFAOYSA-N
Application
Precursor to boron carbide thin films by chemical vapor deposition (CVD).
Trimethylboron is used as an organometallic precursor for the CVD of boron-carbon containing films and as a boron source in the deposition of borophosphosilicate glass (BPSG).
Recommended products
Stainless steel regulators Z527416 or Z527424 are recommended.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Eye Dam. 1 - Press. Gas Liquefied gas - Skin Corr. 1B
Storage Class Code
2A - Gases
WGK
WGK 1
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Regulatory Information
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