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Sigma-Aldrich

Cyclohexyl methacrylate

≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor

Synonym(s):

Methacrylic acid cyclohexyl ester

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About This Item

Linear Formula:
CH2=C(CH3)COOC6H11
CAS Number:
101-43-9
Molecular Weight:
168.23
Beilstein:
2045235
EC Number:
202-943-5
MDL number:
MFCD00014292
UNSPSC Code:
12162002
PubChem Substance ID:
24865610
NACRES:
NA.23

Quality Level

100

Assay

≥97%

form

liquid

contains

~60 ppm monomethyl ether hydroquinone as inhibitor

refractive index

n20/D 1.458 (lit.)

bp

68-70 °C/4 mmHg (lit.)

density

0.964 g/mL at 25 °C (lit.)

SMILES string

CC(=C)C(=O)OC1CCCCC1

InChI

1S/C10H16O2/c1-8(2)10(11)12-9-6-4-3-5-7-9/h9H,1,3-7H2,2H3

InChI key

OIWOHHBRDFKZNC-UHFFFAOYSA-N

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General description

Cyclohexyl methacrylate(CHMA) is an acrylate monomer with a high-refractive index, commonly used in ultraviolet (UV) curing processes due to its ability to rapidly polymerize under UV light exposure. UV-curable CHMA-based coatings, adhesives, and inks offer fast curing, excellent hardness, hydrophobicity, and high durability. It has good optical clarity, resulting in optical lenses with high transparency and minimal distortion. It can also be used as a crosslinking agent in copolymer systems for dental composites and tissue engineering to enhance the mechanical and thermal properties of the resulting materials.

Application

Cyclohexyl methacrylate can be used:



  • As a monomer to prepare poly(cyclohexyl methacrylate) (PCHMA) thin films for high-performance luminescent solar concentrators(LSCs). These LSCs can be used to fabricate high-quantum yield photovoltaic solar cells.
  • As a comonomer to prepare photo-patternable quantum dot-acrylate resins for fabricating light-emitting diodes with high color transparency.
  • As a monomer to synthesizesuperhydrophobic silica nanoparticle surfaces for various applications such as anti-corrosionsurfaces, drag reduction, and energy conservation.

Pictograms

Exclamation mark
GHS07

Signal Word

Warning

Hazard Statements

H315,H317,H319,H335

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3

Target Organs

Respiratory system

WGK

WGK 1

Flash Point(F)

181.4 °F

Flash Point(C)

83 °C

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Fabrication of light emitting diodes using photo-patternable quantum dot-acrylate resins
Kab Pil Yang, et al.
Journal of Materials Chemistry, 9, 17084-17088 (2021)
High-Performance Luminescent Solar Concentrators Based on Poly (Cyclohexylmethacrylate)(PCHMA) Films
Francisco Jos'e Ostos, et al.
Polymers, 12, 2898-2898 (2020)
Florian Jakobs et al.
Materials (Basel, Switzerland), 13(8) (2020-04-29)
For most kinds of active polymer optical fibers, a homogeneous distribution of dye molecules over the entire fiber length and cross section is required. In this study, chemical bonding of dyes to poly(methyl methacrylate) (PMMA) by copolymerization is achieved within
Azeotropic Binary Solvent System Containing Nonfluorinated Polymer-Grafted Silica Nanoparticles for the Fabrication of a Superhydrophobic Surface
Kai-Yen Chin, et al.
Langmuir, 39, 9841-9849 (2023)
Leonard I Atanase et al.
Journal of colloid and interface science, 549, 171-178 (2019-04-29)
The interpolymer complex formation between poly(vinylpyridine)-based polymers with poly(acrylic acid) (PAA), in aqueous or organic medium, is driven by the hydrogen-bonding complexation. Well-defined nanostructures, with specific practical applications, may be obtained by taking advantage of such non-covalent interactions. Poly(2-vinylpyridine)-b-poly(cyclohexyl methacrylate)
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