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407216

Sigma-Aldrich

Triarylsulfonium hexafluorophosphate salts, mixed

50% in propylene carbonate

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About This Item

CAS Number:
109037-77-6
MDL number:
MFCD03412152
UNSPSC Code:
12352300
PubChem Substance ID:
24865433
NACRES:
NA.23

form

liquid

concentration

50% in propylene carbonate

refractive index

n20/D 1.5 (lit.)

density

1.32 g/mL at 25 °C (lit.)

SMILES string

F[P-](F)(F)(F)(F)F.F[P-](F)(F)(F)(F)F.F[P-](F)(F)(F)(F)F.S(c1ccccc1)c2ccc(cc2)[S+](c3ccccc3)c4ccccc4.S(c5ccc(cc5)[S+](c6ccccc6)c7ccccc7)c8ccc(cc8)[S+](c9ccccc9)c%10ccccc%10

InChI

1S/C36H28S3.C24H19S2.3F6P/c1-5-13-31(14-6-1)38(32-15-7-2-8-16-32)35-25-21-29(22-26-35)37-30-23-27-36(28-24-30)39(33-17-9-3-10-18-33)34-19-11-4-12-20-34;1-4-10-20(11-5-1)25-21-16-18-24(19-17-21)26(22-12-6-2-7-13-22)23-14-8-3-9-15-23;3*1-7(2,3,4,5)6/h1-28H;1-19H;;;/q+2;+1;3*-1

InChI key

BXEZIWXFNSCYKD-UHFFFAOYSA-N

Related Categories

General description

Mixed triarylsulfonium hexafluorophosphate salts are cationic photoinitiators which are used as ultraviolet curing agents that have bifunctional cross-linking monomers.

Application

It can be mixed with propylene glycol monomethyl ether acetate (PGMA) that may be blended with bisphenol F resin which can be used in the fabrication of UV curable nano-imprinted epoxy resist. It can also be used as a photo-initiator for photo-polymerization of epoxy/acrylate composites which find applications in UV protective coating on electronic devices.

Pictograms

Exclamation mark
GHS07

Signal Word

Warning

Hazard Statements

H319

Precautionary Statements

P305 + P351 + P338

Hazard Classifications

Eye Irrit. 2

WGK

WGK 3

Flash Point(F)

closed cup

Flash Point(C)

closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Novel visible photoinitiators systems for free-radical/cationic hybrid photopolymerization.
Podsiadly R.
Dyes and Pigments, 91(3), 422-426 (2011)
Nanoimprinting ultrasmall and high-aspect-ratio structures by using rubber-toughened UV cured epoxy resist.
Shin YJ, et al.
Nanotechnology, 24(25), 255302-255302 (2013)
Kinetics study of the UV-initiated cationic polymerization of cycloaliphatic diepoxide resins.
Voytekunas VY, et al.
European Polymer Journal, 44(11), 3640-3649 (2008)

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