40307
Hydrogen peroxide solution
semiconductor grade VLSI PURANAL™ (Honeywell 17606), ≥30%
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About This Item
Empirical Formula (Hill Notation):
H2O2
CAS Number:
Molecular Weight:
34.01
Beilstein:
3587191
MDL number:
UNSPSC Code:
12352304
PubChem Substance ID:
Recommended Products
grade
semiconductor grade VLSI PURANAL™ (Honeywell 17606)
vapor pressure
23.3 mmHg ( 30 °C)
Assay
≥30%
CofA
specification on request
shelf life
~2 yr
reaction suitability
reagent type: oxidant
concentration
25-35%
density
1.110 g/cm3
storage temp.
2-8°C
SMILES string
OO
InChI
1S/H2O2/c1-2/h1-2H
InChI key
MHAJPDPJQMAIIY-UHFFFAOYSA-N
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General description
Hydrogen peroxide is a strong oxidizer. It may be produced industrially by anthraquinone oxidation. it is used in semiconductor industry essentially for cleaning silicon wafers, removal of photoresists and to etch metallic copper on printed circuit boards. Ultrapurification of hydrogen peroxide by reverse osmosis has been reported in detail.
Application
Semiconductor grade hydrogen peroxide was used to etch TiN 2 and GaAs structures.
Legal Information
PURANAL is a trademark of Honeywell Specialty Chemicals Seelze GmbH
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Aquatic Chronic 3 - Eye Dam. 1
Storage Class Code
5.1B - Oxidizing hazardous materials
WGK
WGK 1
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Regulatory Information
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TiN metal hardmask etch residue removal on advanced porous low-k and Cu device with corner rounding scheme
Cui H, et al.
Solid State Phenomena, 187 (2012)
Ultrapurification of hydrogen peroxide solution from ionic metals impurities to semiconductor grade by reverse osmosis.
Abejon R, et al.
Separation and Purification Technology, 76(1), 44-51 (2010)
Localized GaAs etching with acidic hydrogen peroxide solutions
Shaw DW, et al.
Journal of the Electrochemical Society, 128(4), 874-880 (1981)
Jose M Campos-Martin et al.
Angewandte Chemie (International ed. in English), 45(42), 6962-6984 (2006-10-14)
Hydrogen peroxide (H2O2) is widely used in almost all industrial areas, particularly in the chemical industry and environmental protection. The only degradation product of its use is water, and thus it has played a large role in environmentally friendly methods
Shoichi Iriguchi et al.
Blood, 125(2), 370-382 (2014-10-29)
Although overexpression of T-bet, a master transcription factor in type-1 helper T lymphocytes, has been reported in several hematologic and immune diseases, its role in their pathogenesis is not fully understood. In the present study, we used transgenic model mice
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