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Merck
CN

40233

Hydrochloric acid

≥32%, semiconductor grade PURANAL™ (Honeywell® 17863)

Synonym(s):

Hydrogen chloride (HCl)

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About This Item

Empirical Formula (Hill Notation):
HCl
CAS Number:
7647-01-0
Molecular Weight:
36.46
UNSPSC Code:
12352300
PubChem Substance ID:
57649945
MDL number:
MFCD00011324
Beilstein/REAXYS Number:
1098214

Key Documents

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Product Name

Hydrochloric acid, ≥32%

InChI

1S/ClH/h1H

InChI key

VEXZGXHMUGYJMC-UHFFFAOYSA-N

vapor pressure

3.23 psi ( 21.1 °C), 7.93 psi ( 37.7 °C)

assay

≥32%

CofA

specification on request

concentration

90-100%

color

clear light yellow

bp

>100 °C (lit.)

solubility

H2O: miscible (completely)

density

1.18 g/mL at 20 °C

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General description

Semiconductor grade hydrochloric acid has been characterized by inductively couple plasma mass spectrometry (ICP-MS). The trace detection of V, Cr, As and Se in 20% HCl was determined in the study. Its efficiency as a microabrasive was studied.

Application

Hydrochloric acid may be used in the formulation of “standard cleaning bath” to purify metallurgical grade silicon (MGS) and polysilicon. Varying concentrations of the acid aided formation of spherical and rod like cellulose nanocrystals. Aqueous mixture of hydrochloric acid and Α-hydroxy acids (lactic, citric, malic, and tartaric acids) may be used to etch a III-V semiconductor (InP).

pictograms

CorrosionExclamation mark
GHS05,GHS07

signalword

Danger

Hazard Classifications

Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1B - STOT SE 3

target_organs

Respiratory system

Storage Class

8B - Non-combustible corrosive hazardous materials

wgk

WGK 1

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

Regulatory Information

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Certificates of Analysis (COA)

Lot/Batch Number
SZBF0400V
SZBD2260V
SZBC2890V
SZBC1370
SZBC1370V

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Electrochemical properties of metallurgical-grade silicon in hydrochloric acid.
Kareh KA
Electrochimica Acta, 54(26), 6548-6553 (2009)
Semiconductor Surface-Molecule Interactions, Wet etching of InP by ?-hydroxy acids
Bandaru P and Yablonovitch E
Journal of the Electrochemical Society, 149, G599-G602 (2002)
Analysis of semiconductor-grade HCl with the ELAN DRC ICP-MS: elimination of chloride-based interferences.
Kishi Y and Kawabata K
Atomic Spectroscopy, 23(5), 165-169 (2002)
Douglas M McMillan et al.
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