Skip to Content

Dear Customer:

The current international situation is complex and volatile, and uncertain tariff policies may potentially impact our product prices. Given these uncertainties, we value your understanding regarding order-related matters.

If you decide to place an order during this period, we reserve the right to adjust the price based on the evolving situation. We understand that market changes may cause inconvenience. We will negotiate with you if there’s a significant price fluctuation due to tariff policy changes before the order’s actual delivery, and in such cases we may adjust or cancel the order as necessary.

Merck
CN
All Photos(2)

Key Documents

Safety Information

339113

Sigma-Aldrich

Tantalum(V) ethoxide

99.98% trace metals basis

Synonym(s):

Pentaethoxytantalum, Pentaethyl tantalate, Tantalum ethylate, Tantalum pentaethoxide, Tantalum(V) ethoxide

Sign Into View Organizational & Contract Pricing

Select a Size

20 μG
CN¥3,096.05
50 μG
CN¥5,521.21

CN¥3,096.05


Estimated to ship onJuly 18, 2025Details


Request a Bulk Order

Select a Size

Change View
20 μG
CN¥3,096.05
50 μG
CN¥5,521.21

About This Item

Linear Formula:
Ta(OC2H5)5
CAS Number:
Molecular Weight:
406.25
Beilstein:
3678999
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

CN¥3,096.05


Estimated to ship onJuly 18, 2025Details


Request a Bulk Order

Quality Level

Assay

99.98% trace metals basis

form

liquid

reaction suitability

core: tantalum
reagent type: catalyst

impurities

<2 wt. % toluene

refractive index

n20/D 1.487 (lit.)

bp

155 °C/0.01 mmHg (lit.)

mp

21 °C (lit.)

density

1.566 g/mL at 25 °C (lit.)

SMILES string

CCO[Ta](OCC)(OCC)(OCC)OCC

Looking for similar products? Visit Product Comparison Guide

Compare Similar Items

View Full Comparison

Show Differences

1 of 4

This Item
EMU072451EMU085071EMU069331
esiRNA cDNA target sequence

TCATTCTCTTACAACCACCTTCCATATACCTTCAAGTCAACATTACCAAGAAGAGCATTCACCATCATTGTCAGGATCAGATTCTCTTCTTCAAATAACCACTCCTGTGGTGGCTTCAACTGTAGGTAACCCAAATCAGCATTCAGCAACAATGTCAACACCAGCTATTCATGTCTCAACTTATCACACGGCCCCTACTGAAGTGTCTGCTGCGTTTGAAGAACAGCCTGTCTCACCACACATTGGAGGAATGCCGTCACCAATTCAACACGATTTTCCTGCACTAGTGATGATACTCATAATTTTGGGCGTGATGGCAGGGATTATCGGAACTATCCTTCTTATCTCTTACTGTATCAGCCGAATGACAAAGAAAAGTTCAGTTGACATCCAATCTCCTGAGGGTGGTGACAACAGTGTGCCTTTGAGTTCTATTGAGCAGACTCCTAATGAAGAGTCCTCCAATGTTTGAAAGACCTCAAGGAAAACAAGACTTCAATCAATGGGAAA

esiRNA cDNA target sequence

GGGCAGGTTGAGTTCATTGTAAATAATTGTGTAAATCACTGTTCTAGTAATTTAAAAATAACATTAATTTTTCTACAAAATGCGAGATTTATAAATGTTTGAAATTGTACCTATTGATAATTAATGGTAAGTTTACTTAAAATAAATGTATCCCTTATTTCTTATCTGCATTTCTCATTTCCAGATGAAAGTTTAGTTATCAGAGATGTTTCAGCACACACAAAAGCCACTTTTCAGTACTTGTTCACATGCACTGACGAGCTAATTAGCAGCAGAAGTGGTTTCTGGAATGATGAACACCTTAATCATTCTGTTAGAACAGATTAGACAGTTCCTACCTCAGCATTTTCAGAAAACACACTTTCAAGGCCAAAAGCCATCATCATCAGTAGAGTCTCCCCTTGCTGAGACCTAATTATCTCCGGGGTTCCATC

esiRNA cDNA target sequence

TGACAGCGAAGGCAATGTAGTGAACAAACCCGACAGCCATGGTGGCAGCCTCGAATGGACAAAGATCTGTGAGAAGTCCTCTAAAGTGATCACCTTCATCGACTTGGCTGGCCACGAGAAGTACCTTAAGACCACTGTTTTTGGCATGACTGGCCACTTGCCTGACTTCTGCATGCTCATGGTGGGCAGCAATGCTGGCATTGTGGGGATGACCAAGGAGCATCTGGGCTTGGCATTGGCACTCAATGTACCTGTGTTTGTGGTTGTCACCAAGATTGACATGTGTCCTGCCAACATCCTTCAAGAAACCCTGAAGCTGCTACAGCGCCTGCTGAAGTCACCAGGCTGCCGGAAGATCCCTGTCCTGGTGCAGAGCAAAGATGATGTGATTGTCACAGCCTCCAACTTCAGCTCTGAGAGGATGTGCCCGATATTCCAGATCTCCAATGTCACAGGTGAGAACCTTGACCTGCTCAAGATGTTCCTCAACCTCCTGTCC

esiRNA cDNA target sequence

CACCAGTTTCGGACCAGTTTCAGACCACGATATGGAGTATACAATAGATGTGTTTTTCCGTCAAAGTTGGAAGGATGAAAGATTAAAATTCAAAGGACCCATGACAGTGCTCCGGCTAAACAACCTTATGGCCAGTAAAATCTGGACTCCAGATACATTTTTCCACAATGGAAAGAAGTCTGTGGCCCACAACATGACCATGCCTAATAAGCTCCTGCGTATCACAGAGGATGGCACTCTGCTGTACACCATGAGGTTGACCGTGAGAGCTGAATGCCCAATGCACTTGGAAGACTTCCCTATGGATGCCCATGCCTGCCCACTAAAATTCGGAAGCTATGCTTATACAAGAGCAGAAGTTGTCTATGAGTGGACCAGAGAGCCAGCCCGTTCAGTGGTTGTAGCAGAAGATGGGTCACGTTT

product line

MISSION®

product line

MISSION®

product line

MISSION®

product line

MISSION®

Ensembl | mouse accession no.

ENSMUSG00000051839

Ensembl | mouse accession no.

ENSMUSG00000025059

Ensembl | mouse accession no.

ENSMUSG00000042535

Ensembl | mouse accession no.

ENSMUSG00000010803

Gene Information

mouse ... GYPA(14934), Gypa(14934)

Gene Information

mouse ... GYK(14933), Gyk(14933)

Gene Information

mouse ... GTPBP1(14904), Gtpbp1(14904)

Gene Information

mouse ... GABRA1(14394), Gabra1(14394)

form

lyophilized powder

form

lyophilized powder

form

lyophilized powder

form

lyophilized powder

storage temp.

−20°C

storage temp.

−20°C

storage temp.

−20°C

storage temp.

−20°C

General description

Tantalum(V) ethoxide Ta(OC2H5)5 is a tantalum alkoxide that can be used as a precursor in the preparation of tantalum oxide by chemical vapor deposition (CVD). It has excellent volatility and thermal stability. It can be synthesized by anodic oxidation of tantalum plate in anhydrous ethanol.[1]

Application

Ta(OC2H5)5 can be used in the formation of ultrathin tantalum oxide based capacitors.[2][3] It can also be used as a liquid precursor in the preparation of tantalum carbide nanopowder for hard coating on metal surfaces.[4]

Pictograms

Flame

Signal Word

Warning

Hazard Statements

Hazard Classifications

Flam. Liq. 3

Storage Class Code

3 - Flammable liquids

WGK

WGK 1

Flash Point(F)

84.2 °F - closed cup

Flash Point(C)

29 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Information

危险化学品

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

The Electrosynthesis of Tantalum Ethoxide
Yang H, et al.
Electrochemistry, 82(9), 743-748 (2014)
Ultrathin tantalum oxide capacitor dielectric layers fabricated using rapid thermal nitridation prior to low pressure chemical vapor deposition
Kamiyama S, et al.
Journal of the Electrochemical Society, 140(6), 1617-1625 (1993)
Controlling the synthesis of TaC nanopowders by injecting liquid precursor into RF induction plasma
Ishigaki T, et al.
Science and Technology of Advanced Materials, 6(2), 111-111 (2005)
Leakage currents in amorphous Ta 2 O 5 thin films
Chiu F, et al.
Journal of Applied Physics, 81(10), 6911-6915 (1997)
Kuo-Shyan Lin et al.
Cancer research, 75(2), 387-393 (2014-12-10)
The bradykinin receptor B1R is overexpressed in many human cancers where it might be used as a general target for cancer imaging. In this study, we evaluated the feasibility of using radiolabeled kallidin derivatives to visualize B1R expression in a

Articles

The properties of many devices are limited by the intrinsic properties of the materials that compose them.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service