317004
Tantalum(V) fluoride
98%
Synonym(s):
Tantalum pentafluoride
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About This Item
Linear Formula:
TaF5
CAS Number:
Molecular Weight:
275.94
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352302
EC Number:
232-022-3
MDL number:
Assay:
98%
Form:
powder
InChI key
YRGLXIVYESZPLQ-UHFFFAOYSA-I
InChI
1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5
SMILES string
F[Ta](F)(F)(F)F
assay
98%
form
powder
reaction suitability
core: tantalum, reagent type: catalyst
density
4.74 g/mL at 25 °C (lit.)
Quality Level
General description
Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.
Application
Tantalum(V) fluoride can be used:
- As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
- As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
- To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
- As a catalyst for N-alkylation of arylamines with benzylalcohols.
signalword
Danger
hcodes
Hazard Classifications
Eye Dam. 1 - Skin Corr. 1B
Storage Class
8B - Non-combustible corrosive hazardous materials
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
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Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
A Enesca, et al.
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
Improvement of Hematite as Photocatalyst by Doping with Tantalum
Xinsheng Zhang, et al.
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Yury Koshtyal, et al.},
Lithium-Ion Batteries, 8, 184-184 (2022)
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