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235857

Sigma-Aldrich

Aluminum ethoxide

97%

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Synonym(s):
Aluminum triethoxide, Triethoxyaluminum
Linear Formula:
Al(OC2H5)3
CAS Number:
555-75-9
Molecular Weight:
162.16
Beilstein:
3678970
EC Number:
209-105-8
MDL number:
MFCD00009658
UNSPSC Code:
12352300
PubChem Substance ID:
24854120
NACRES:
NA.23

Quality Level

200

Assay

97%

form

powder and chunks
solid

reaction suitability

core: aluminum

mp

154-159 °C (lit.)

SMILES string

CCO[Al](OCC)OCC

InChI

1S/3C2H5O.Al/c3*1-2-3;/h3*2H2,1H3;/q3*-1;+3

InChI key

JPUHCPXFQIXLMW-UHFFFAOYSA-N

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Application

Aluminum ethoxide may be used to prepare mesoporous γ-alumina with tailormade properties. It can also be used for the growth of Al2O3 thin films by atomic layer deposition.

Pictograms

FlameCorrosion
GHS02,GHS05

Signal Word

Danger

Hazard Statements

H228,H314

Hazard Classifications

Flam. Sol. 1 - Skin Corr. 1B

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Information

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Hailong Xiong et al.
Advanced science (Weinheim, Baden-Wurttemberg, Germany), 6(6), 1801543-1801543 (2019-04-03)
Mesoporous metal oxides (MMOs) have attracted comprehensive attention in many fields, including energy storage, catalysis, and separation. Current synthesis of MMOs mainly involve use of surfactants as templates to generate mesopores and organic reagents as solvents to hinder hydrolysis and
Tailored mesoporous alumina prepared from different aluminum alkoxide precursors.
May M, et al.
Journal of Porous Materials, 14(2), 159-164 (2007)
Low temperature (< 100oC) deposition of aluminum oxide thin films by ALD with O3 as oxidant.
Kim SK,et al.
Journal of the Electrochemical Society, 153(5), F69-F76 (2006)

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