218170
Ethynyltrimethylsilane
98%
Synonym(s):
Trimethylsilylacetylene
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About This Item
Linear Formula:
(CH3)3SiC≡CH
CAS Number:
Molecular Weight:
98.22
UNSPSC Code:
12352100
NACRES:
NA.22
PubChem Substance ID:
MDL number:
Beilstein/REAXYS Number:
906752
Product Name
Ethynyltrimethylsilane, 98%
refractive index
n20/D 1.388 (lit.)
InChI
1S/C5H10Si/c1-5-6(2,3)4/h1H,2-4H3
SMILES string
C[Si](C)(C)C#C
InChI key
CWMFRHBXRUITQE-UHFFFAOYSA-N
vapor pressure
4.18 psi ( 20 °C)
assay
98%
form
liquid
bp
53 °C (lit.)
density
0.709 g/cm3 (lit.)
storage temp.
2-8°C
Quality Level
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Application
Ethynyltrimethylsilane was used in:
- microwave-assisted, one-pot, three-step Sonogashira cross-coupling-desilylation-cycloaddition reaction for the preparation of 1,4-disubstituted 1,2,3-triazoles
- synthesis of poly(ethynyltrimethylsilane) containing Pd (II) coordination sites
- pyrazole synthesis via 1,3-dipolar cycloaddition of diazo compounds to acetylenes
General description
Laser-induced polymerization of gaseous ethynyltrimethylsilane was used for efficient chemical vapour deposition of polycarbosilane films. Ethynyltrimethylsilane acts as substrate for nickel-catalyzed cross-coupling with benzonitriles.
signalword
Danger
hcodes
Hazard Classifications
Eye Irrit. 2 - Flam. Liq. 2 - Skin Irrit. 2
Storage Class
3 - Flammable liquids
wgk
WGK 1
flash_point_f
-29.2 °F
flash_point_c
-34 °C
ppe
Faceshields, Gloves, Goggles
Regulatory Information
危险化学品
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Francisco J Caparrós et al.
Molecules (Basel, Switzerland), 25(4) (2020-02-26)
A new 2,7,10,15-tetraethynyldibenzo[g,p]chrysene ligand (1) and two tetranuclear gold(I) derivatives containing PPh3 (3) and PMe3 (4) phosphines were synthesized and characterized by 1H and 31P NMR, IR spectroscopy, and high-resolution mass spectrometry. The compounds were studied in order to analyze
Frédéric Friscourt et al.
Organic letters, 12(21), 4936-4939 (2010-10-15)
A microwave-assisted, one-pot, three-step Sonogashira cross-coupling-desilylation-cycloaddition sequence was developed for the convenient preparation of 1,4-disubstituted 1,2,3-triazoles starting from a range of halides, acyl chlorides, ethynyltrimethylsilane, and azides.
Atmospheric pressure chemical vapour deposition of polycarbosilane films via UV laser-induced polymerization of ethynyltrimethylsilane.
Pola J, et al.
Surface and Coating Tech., 149(2), 129-134 (2002)
Tetrahedron Letters, 45, 4989-4992 (2004)
Hong Shang et al.
Advanced materials (Deerfield Beach, Fla.), 30(27), e1801459-e1801459 (2018-05-26)
In situ weaving an all-carbon graphdiyne coat on a silicon anode is scalably realized under ultralow temperature (25 °C). This economical strategy not only constructs 3D all-carbon mechanical and conductive networks with reasonable voids for the silicon anode at one
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