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Quality Level
Assay
98%
form
powder
density
9.68 g/mL at 25 °C (lit.)
SMILES string
O=[Hf]=O
InChI
1S/Hf.2O
InChI key
CJNBYAVZURUTKZ-UHFFFAOYSA-N
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Related Categories
Application
- Hafnium(IV) oxide: Utilized predominantly in the semiconductor industry, Hafnium(IV) oxide offers excellent thermal and chemical stability, which makes it suitable as a high-k gate dielectric material in metal-oxide-semiconductor (MOS) devices. Its application has become increasingly important with the miniaturization of electronic components, aiding in the enhancement of transistor performance without further reducing the component size. This role is critical in the development of more efficient, faster computing technologies (Sigma-Aldrich, CAS 12055-23-1).
WGK
nwg
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
Certificates of Analysis (COA)
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In recent years silicon carbide, SiC, has re-emerged as a vital technological material that is crucial in many materials and engineering applications.
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