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Safety Information

201073

Sigma-Aldrich

Aluminum-tri-sec-butoxide

97%

Synonym(s):

Aluminum sec-butoxide

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About This Item

Linear Formula:
Al[OCH(CH3)C2H5]3
CAS Number:
2269-22-9
Molecular Weight:
246.32
Beilstein:
3910908
EC Number:
218-871-2
MDL number:
MFCD00009327
UNSPSC Code:
12352103
PubChem Substance ID:
24851994
NACRES:
NA.23

¥6,317.12

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Quality Level

100

Assay

97%

form

liquid

autoignition temp.

763 °F

expl. lim.

9.8 %

reaction suitability

core: aluminum

bp

200-206 °C/30 mmHg (lit.)

density

0.967 g/mL at 25 °C (lit.)

SMILES string

CCC(C)O[Al](OC(C)CC)OC(C)CC

InChI

1S/3C4H9O.Al/c3*1-3-4(2)5;/h3*4H,3H2,1-2H3;/q3*-1;+3

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concentration

500 ng/μL in TE buffer; DNA (10μg of plasmid DNA)

concentration

500 ng/μL in TE buffer; DNA (10μg of plasmid DNA)

concentration

500 ng/μL in TE buffer; DNA (10μg of plasmid DNA)

concentration

500 ng/μL in TE buffer; DNA (10μg of plasmid DNA)

product line

MISSION®

product line

MISSION®

product line

MISSION®

product line

MISSION®

storage temp.

−20°C

storage temp.

−20°C

storage temp.

−20°C

storage temp.

−20°C

shipped in

dry ice

shipped in

dry ice

shipped in

dry ice

shipped in

dry ice

Quality Level

200

Quality Level

200

Quality Level

200

Quality Level

200

General description

Aluminum-tri-sec-butoxide is a metal organic chemical vapor deposition precursor and a chelating agent. It is widely used as a sol-gel precursor to deposit alumina thin films by atomic layer deposition method.

Application

Aluminum-tri-sec-butoxide can be used as a precursor :
  • To prepare Al2O3-based quasi-solid electrolyte for Li metal anodes. This ensures long cycle lifetime and high constant current density.
  • To synthesize nanospinel MgAl2O4 powder by a sol–gel method at low-temperature processing.
  • To fabricate transparent superhydrophobic aluminum oxide thin films to prevent soiling of solar panels.
  • To synthesize mesoporous alumina with large surface area to fabricate a functional interlayer for separator coating in a Li–S battery. It helps to suppress the shuttle effect and enhances cyclic stability andrateperformance.

Features and Benefits

  • Suitable for thin film deposition
  • Solubility in various solvents allows for the facile preparation of solution-based precursors
  • High thermal stability
  • Facilitates the anchoring of catalytic metal nanoparticles onto substrates

Has been utilized in making high-surface-area alumina using 2,4-pentanedione (Aldrich product P775-4) as a chelating agent.

Pictograms

FlameSkull and crossbones
GHS02,GHS06

Signal Word

Danger

Hazard Statements

H226,H302,H311

Hazard Classifications

Acute Tox. 3 Dermal - Acute Tox. 4 Oral - Flam. Liq. 3

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

78.8 °F - closed cup

Flash Point(C)

26 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Information

危险化学品

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