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蒸汽压
3.7 mmHg ( 20 °C)
质量水平
产品线
ReagentPlus®
检测方案
≥99.5%
自燃温度
669 °F
expl. lim.
13.1 %
折射率
n20/D 1.402 (lit.)
bp
145-146 °C (lit.)
145-146 °C
溶解性
water: soluble 198 g/L at 20 °C
密度
0.970 g/mL at 25 °C (lit.)
SMILES字符串
COCC(C)OC(C)=O
InChI
1S/C6H12O3/c1-5(4-8-3)9-6(2)7/h5H,4H2,1-3H3
InChI key
LLHKCFNBLRBOGN-UHFFFAOYSA-N
基因信息
human ... AR(367) , IMPDH2(3615) , NR3C1(2908) , PGR(5241)
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一般描述
醋酸丙二醇单甲基醚(PGMEA)是一种光阻材料溶剂。已有研究关于不同土壤类型微生物对其的降解作用。吸入研究结果已经获得了口服参考剂量(RfD)的PGMEA值。(5-烷基磺酰亚胺-5H-噻吩-2-吡啶)-2-甲基苯基乙腈在PGMEA中的溶解度已被分析。
应用
丙二醇单乙醚乙酸酯用于研究开发流控通道，并将其并入基于聚二甲基硅氧烷(PDMS)的微流控装置中。
法律信息
Dow Chemical 产品。
®Dow Chemical Company 的商标
®Dow Chemical Company 的商标
ReagentPlus is a registered trademark of Merck KGaA, Darmstadt, Germany
DOWANOL is a registered trademark of The Dow Chemical Company or an affiliated company of Dow
警示用语：
Warning
危险声明
危险分类
Flam. Liq. 3
WGK
WGK 2
闪点(°F)
113.9 °F
闪点(°C)
45.5 °C
法规信息
危险化学品
Yug C Saraswat et al.
Journal of colloid and interface science, 564, 43-51 (2020-01-07)
Our ability to dictate the colloid geometry is intimately related to self-assembly. The synthesis of anisotropic colloidal particles is currently dominated by wet chemistry and lithographic techniques. The wet chemical synthesis offers limited particle geometries at bulk quantities. Lithographic techniques
Comparison of photoresist shelf life in PGMEA and CA solvent systems.
Nelson WC.
SPIE Proc., 2195 (1994)
Chao Li et al.
Science advances, 6(16), eaay9919-eaay9919 (2020-06-05)
Recently, the functionality of under oil open microfluidics was expanded from droplet-based operations to include lateral flow in under oil aqueous channels. However, the resolution of the under oil fluidic channels reported so far is still far from comparable with
Christian Bleilevens et al.
Scientific reports, 8(1), 8031-8031 (2018-05-26)
Extracorporeal lung assist technology is one of the last options in critical care medicine to treat patients suffering from severe oxygenation and decarboxylation disorders. Platelet activation along with the consequent thrombus formation is a potentially life-threatening complication of this technique.
Novel photoacid generators for chemically amplified resists with g-line, i-line, and DUV exposure.
Asakura T, et al.
SPIE Proc., 4345 (2001)
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