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Merck
CN

294993

greener alternative

anhydrous, ≥99.98%

别名:

Ammonia gas

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关于此项目

线性分子式:
NH3
化学文摘社编号:
分子量:
17.03
UNSPSC Code:
12142100
NACRES:
NA.22
PubChem Substance ID:
EC Number:
231-635-3
Beilstein/REAXYS Number:
3587154
MDL number:
Assay:
≥99.98%
Form:
liquefied gas
Grade:
anhydrous
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产品名称

氨, anhydrous, ≥99.98%

InChI key

QGZKDVFQNNGYKY-UHFFFAOYSA-N

InChI

1S/H3N/h1H3

SMILES string

N

grade

anhydrous

vapor density

0.6 (vs air)

vapor pressure

8.75 atm ( 21 °C)

assay

≥99.98%

form

liquefied gas

autoignition temp.

1203 °F

expl. lim.

25 %

greener alternative product characteristics

Design for Energy Efficiency
Learn more about the Principles of Green Chemistry.

sustainability

Greener Alternative Product

pH

~10-12 (20 °C, 50 g/L)

pKa (25 °C)

9.25

bp

−33 °C (lit.)

mp

−78 °C (lit.)

solubility

water: 531 g/L at 20 °C

density

0.7 g/cm3 at -33 °C

greener alternative category

Quality Level

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Other Notes

Packaging

储存于碳钢气阀瓶中,带CGA180M/CGA110F针阀。

适用:
  • Aldrich®气阀瓶站系统
  • Aldrich®气阀瓶气体调节器

Legal Information

Aldrich is a registered trademark of Sigma-Aldrich Co. LLC

Application

TiN化学气相沉淀试剂。
无水氨气在动态反应细胞技术(DRC)中被用来去除干扰离子,而不会丧失灵敏度。它还可以用来为燃烧制备混合磁体矿-赤铁矿混合物调节pH。
氨气可以用来为燃烧制备混合磁体矿-赤铁矿纳米颗粒调节pH的碱。这些纳米颗粒是很有前途的潜在吸收剂,可以从水中移除重金属离子。

General description

我们致力于为您提供更环保的替代产品,以符合“绿色化学的12项原则”的一项或多项原则要求。该产品为增强型,提高了能源效率。点击此处,查看更多详情。

signalword

Danger

Hazard Classifications

Acute Tox. 3 Inhalation - Aquatic Acute 1 - Aquatic Chronic 2 - Eye Dam. 1 - Flam. Gas 2 - Press. Gas Liquefied gas - Skin Corr. 1B

supp_hazards

存储类别

2A - Gases

wgk

WGK 2

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Faceshields, Gloves, Goggles, multi-purpose combination respirator cartridge (US)

法规信息

监管及禁止进口产品
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历史批次信息供参考:

分析证书(COA)

Lot/Batch Number

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商品

Acid and base chart lists the strength of acids and bases (strongest to weakest) in order. Simple to use laboratory reference chart for scientists, researchers and lab technicians.

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

近十年来出现了原子层沉积(ALD)技术以满足各种需求,包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。

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