- Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.
Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.
Advanced materials (Deerfield Beach, Fla.) (2015-06-20)
Zhiwei Sun, Zhenbin Chen, Wenxu Zhang, Jaewon Choi, Caili Huang, Gajin Jeong, E Bryan Coughlin, Yautzong Hsu, XiaoMin Yang, Kim Y Lee, David S Kuo, Shuaigang Xiao, Thomas P Russell
PMID26088198
ABSTRACT
Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.
MATERIALS